Random Orbital Motion Platen for More Consistent Polishing

NOVA’s random orbital motion platen helps support a more uniform polishing process by distributing contact across the polishing film rather than concentrating wear in one repeated path. This motion helps promote more even film wear, reduce localized wear patterns, and extend the usable life of polishing consumables. By minimizing repetitive motion patterns, random orbital motion can also help reduce polishing artifacts such as grooves, flat spots, or repeated scratch patterns. For photonic components where surface quality, geometry, and process control are critical, random orbital motion gives operators a more consistent polishing surface and helps support repeatable results from part to part. KrellTech’s NOVA™ polishing systems are designed for controlled photonic component processing, including fiber arrays, waveguides, PICs, bare fibers, fiber optic connectors, and other precision optical components.